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Thin film deposition

  Thin Film Deposition
Thin films of metals, dielectrics and insulators are deposited on a vide variety of substrates, with high precision in thickness and composition.

Different deposition methods are used to customize the best film to your specific demands.

We offer films by sputtering, low pressure chemical vapor deposition (LPCVD), thermal and electron beam evaporation and plasma enhanced chemical vapor deposition (PECVD).

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(Extract from LIMS) 
DetailsIDPExpertechLPCVD furnace
DetailsBarbaraProvacPAK 600 Coating System
DetailsIndiraBalzersBA 510 Thermal Evaporator
DetailsPekkaPlasmalab80Plus (Oxford PECVD System) Chamber A
DetailsAJA Sputter AlbanovaAJA International Inc.Orion
DetailsEdwards Auto 306 AlbanovaEdwardsAuto306 with FL400 chamber
DetailsAJA 3 Sputter AlbanovaAJA InternationalATC Orion-8
DetailsPLDNeocera IncNeocera Pioneer 180 UHV PLD
DetailsEnduraApplied MaterialsPVD
DetailsAJA 2 Sputter AlbanovaAJA International Inc.Orion
DetailsParylene coaterSCSPDS 2010
DetailsAJA evaporator AlbanovaAJA international Inc.ATC1800
DetailsICPCVDOxford Plasma TechnologyPlasmaPro 100


2020-06-30 Quality group (P)