View
Edit
Add New Module
Add Existing Module
Insert:
Visibility:
Same As Page
Page Editors Only
Module:
Myfab
Realize your nano vision
Myfab
Myfab Chalmers
Myfab KTH
Myfab Lund
Myfab Uppsala
Login
Search
Myfab
Myfab Chalmers
Myfab KTH
Myfab Lund
Myfab Uppsala
Myfab Chalmers
//
Resources
//
All tools
All tools
Name
Manufacturer
Model
Current toolratetype name
Details
Ozone Cleaning - Novascan
Novascan
PSD-UVT
B
Details
SPM - Bruker Dimension ICON
Bruker
Dimension ICON
C
Details
Diffractometer Xray - Panalytical XPert
Panalytical
XPert PRO MRD
C
Details
CVD - Carbolite - 2D materials
Carbolite
EZS-3G 12/600B 1200C
A
Details
Transfer stage - Manual for 2D and 1D materials
?
?
A
Details
X-ray photoemission spectroscopy – Scienta Omicron
Scienta-Omicron GmbH
Argus CU
C
Details
Glove Box - 2D materials
MBRAUN
LABstar pro
B
Details
Smoltek CVD
--
--
C
Details
Software - GenISys LAB
GenIsys
LAB simulation package
A
Details
Software - GenISys BEAMER
GenISys GmbH
Proximity Correction
A
Details
Software - Proxecco proximity correction
PDF Solutions GmBH
Proxecco-7.0
B
Details
Mask aligner - Canon PPC-210
Canon
PPC-210
C
Details
Sputter - Pfeiffer
Pfeiffer Vacuum
SLS-630G "Spider"
C
Details
Sputter - AJA
AJA International
AJA Orion 6-UD
D
Details
Sputter - DCA - Quantum
DCA
MTD 620
D
Details
Evaporator - Varian
Varian
VT 118 UHV
C
Details
Sputter - Balzers
Balzers/Pfeiffer
PLS 550
C
Details
Evaporator - AVAC
AVAC
HVC600
C
Details
Evaporator - Edwards
Edwards
Auto 306
B
Details
PLD - Small System
Chalmers/Staffan Pehrson
Generation I
B
Details
PLD - Compex 205 Laser
Lambda-Physik
Compex 205
C
Details
PLD - Calas System
Chalmers/Staffan Pehrson
Generation III
C
Details
PLD - RHEED System
Chalmers/TSST
High pressure RHEED
C
Details
PLD - DCA Cluster
DCA Instruments
UHV PLD
C
Details
Sputter - DCA Cluster - Oxides
DCA
MTD 450
D
Details
Sputter - DCA Cluster - Metals
DCA
MTD 450
D
Details
Sputter - FHR
FHR
MS150
D
Details
Sputter - NORDIKO
Nordiko
2000
B
Details
CVD - MgB2 - PVD hybrid
Chalmers
-
C
Details
Evaporator - Lesker PVD 225 #2
Lesker
PVD 225
D
Details
PLD - Carbon System
Chalmers
-
C
Details
Evaporator - Plassys
Plassys
MEB 550 S
D
Details
Buffing tool - LCtec - LCD line
LC-tec AB
?
C
Details
Aligner & Assembler - Ciposa - LCD line
Ciposa SA
Switzerland
B
Details
Vacuum packer - LCD line
Multivac
509.5
A
Details
UV illumination box
Solectro AB
??
A
Details
Glue Dispensing System - LCD line
StepCraft 210
MetCal modell DX-250.
B
Details
Evaporator - Plassys UHV
Plassys
MEB 550 SL3 - UHV
A
Details
UPS
N/A
N/A
A
Details
Emergency diesel generator
N/A
N/A
A
Details
Gas detection alarm
Honeywell
N/A
A
Details
Steam boiler #2
Osby Parca
Opex-Å
A
Details
R211 FFU1
ZIEHL-ebm AB
GR-V 31G-4KK.2F
A
Details
Parking spot - Hugo Grauers gata 1B
N/A
N/A
A
Details
Workshop power tools
N/A
N/A
A
Details
Fan filter units
ZIEHL-ebm AB
GR-V 31G-4KK.2F
A
Details
Wafer Inspection System - IR
-
-
A
Details
Steam production
N/A
N/A
A
Details
Steam boiler #1
Osby Parca
Opex-Å
A
Details
Flood exposure - Bachur & Associates - DUV
Bachur & Associates
LS 150X-5C2 500W
B
Details
Spinner - Suss RCD8
Suss
RCD8
C
Details
Mask aligner - Suss MA 6 #2
Suss MicroTec
MA6
C
Details
Scriber breaker - Loomis
Loomis
LSD-100
B
Details
Mask aligner - Suss MJB3 UV 400 #2
Karl Suss
MJB3
C
Details
Spinner - Suss LabSpin6
Suss Microtech
-
A
Details
Wet Bench - Hotplate & HMDS & Oven
Stangl
Stangl
A
Details
Surface profiler - Tencor AS500 #1
Tencor
AS500
B
Details
Surface profiler - Tencor AS500 #2
KLA Tencor
AS500
B
Details
Furnace - Wet oxidation
Chalmers
Furnace for III/V materials
C
Details
Spinner - Suss LabSpin6
SUSS MicroTec
1116
A
Details
Spinner - BLE
BLE
BLE
A
Details
Wet Bench - Acid & Base - Developer Spinner - Osiris
Osiris
Osiris BASIXX
A
Details
Mask aligner - Suss MA/BA 6 #1
Suss MicroTec
MA/BA 6
C
Details
Wet Bench - Acid & Base - Developer Work
Stangl
Wet bench
A
Details
Mask aligner - Suss MJB3 UV 400 #1
Karl Suss
MJB3
C
Details
Surface profiler - Tencor P15
KLA Tencor
P-15
B
Details
Wet Bench - Solvent - Ultrasonic bath - Microwave line
PM-plast
Wet bench
A
Details
Wet Bench - Acid & Base - Developer Bath - Microwave line
PM-plast
Wet bench
A
Details
Wet Bench - Acid & Base - Developer Work - Microwave line
PM-plast
Wet bench
A
Details
Spinner - BLE & HMDS hotplate - Microwave line
PM-plast
Wet bench
A
Details
Hotplate - Solar-semi & BLE - Microwave line
PM-plast
Wet bench
A
Details
Spinner - Suss LabSpin6
Stangl
#501
A
Details
Wet bench Acid & Base - Developer work
Stangl
Wet bench
A
Details
Solar-Semi Hot Plate
Solar-Semi
Wet bench
A
Details
Wafer Expander - Dynatex
Dynatex
DXE Wafer Expander
A
Details
Maskless lithography - SmartPrint
Microlight 3D
SmartPrint
B
Details
Laminator for SUEX Dry Film Photoresist
GBC
PRO SERIES 3600
A
Details
Hotplate - Wenesco - SU8/BCB
Wenesco
Custom
A
Details
Critical point dryer - Tousimis
Tousimis
Autosamdri 931 GL
A
Details
White Light Reflectance Spectroscopy (WLRS) - ThetaMetrisis
Theta Metrisis
FR-Pro-UV/VIS
A
Details
Ellipsometer - J.A. Woollam RC2
J. A. Woollam
RC2
C
Details
PECVD - Oxford
Oxford Instruments
Plasma Pro 100 PECVD
C
Details
CMP - LNF
Logitech
PM6
B
Details
Substrate bonder - LNF
Logitech
?
A
Details
Dry etch RIE - SAMCO Oxygen
SAMCO
10NR
C
Details
Dicing Saw - Disco DAD3321
Disco
3321
C
Details
MBE - EPI 930
MBE
EPI 930
E
Details
Fume Hood - Solvent - Polishing preparation
Stangl
Fume Hood
A
Details
Fume hood - Solvent - Dicing preparation
Stangl
Fume Hood
A
Details
CMP Polishing & Lapping tool - Logitech PM5 #1
Logitech
PM5
C
Details
Scriber - Suss - Hard wafers
-
-
A
Details
Dicing saw - Disco DAD3350
Disco
DAD3350
C
Details
Scriber - Suss - Soft wafers
-
-
A
Details
Dry etch RIE - Advanced Vacuum
PlasmaTherm/Advanced Vacuum
Batchtop m/91
C
Details
Dry etch RIE - Plasma-Therm
Plasmatherm
BatchTop m/95
C
Details
Dry etch Stripper - TePla
TePla AG
300PC
C
Details
Ozone Cleaning - FHR
FHR Anlagenbau GmbH
UVOH 150
B
Details
Dry etch RIE - Plasma-Therm - Oxygen
Plasma Therm
BatchTop RIE
C
Details
CMP Polishing & Lapping tool - Logitech PM5 #2
Logitech
PM5
C
Details
MBE - Riber C21
Riber
Compact 21 T-E Cluster
E
Details
Dry etch ICP - STS
STS
ICP MPX
D
Details
Dry etch IBE - Oxford Ionfab 300 Plus
Oxford
Ionfab 300 Plus
D
Details
Evaporator - Lesker PVD 225 #1
Lesker
PVD 225
D
Details
Evaporator - Lesker Nano Cr
Lesker
Nano36
B
Details
Dry etch RIBE - Oxford Ionfab 300
Oxford Plasma Technology
Ionfab 300
C
Details
RTP - AccuThermo AW610 - InP
Allwin21
AccuThermo AW610
C
Details
RTP - AccuThermo AW610 - Wide bandgap
Allwin21
AccuThermo AW610
C
Details
Evaporator - Lesker Spectros
Lesker
Spectros
D
Details
RTP - JIPELEC JetFirst 100
JIPELEC
JetFirst 100
C
Details
Furnace - Thermolyne - BCB cure
Barnstead Thermolyne
47900
A
Details
RTP - JIPELEC JetFirst 200
JIPELEC
JetFirst 200
C
Details
PC monitor 43"
Dell
Dell 43'' UltraSharp U4320Q 4K USB-C
A
Details
Wet Bench - Solvent - Chemical preparation
Stangl
-
A
Details
Wet Bench - Acid & Base - Chemical preparation
Stangl
0
A
Details
Substrate bonder - Suss SB6
-
-
C
Details
Intercom Set 2, yellow
Eartec
UltraLITE UL5S HD Kit
A
Details
Intercom Set 1, black
Eartec
UltraLITE UL5S HD Kit
A
Details
MCC115 PL1 Group 1
Chalmers
1
A
Details
MCC115 PL1 Group 2
Chalmers
2
A
Details
MCC115 PL2 Group 1
Chalmers
3
A
Details
Dry etch RIBE - NILT
Oxford Instruments
Ionfab
D
Details
SEM - Zeiss Supra 55 - EDX
Zeiss
Supra 55 VP
C
Details
SEM - Zeiss Supra 60 VP - EDX
Zeiss
Supra 60 VP
C
Details
SPM - Bruker Dimension 3100
Bruker
Dimension 3100 SPM
C
Details
Spectrometer EDX - IXRF
IXRF
-
B
Details
Software - SPM/AutoCAD
HP
140
B
Details
Microscope Automatic - Nikon L200ND
Nikon
L200ND
B
Details
EBL - Raith EBPG 5200
Raith
EBPG 5200
E
Details
Process cooling, loop 1
N/A
N/A
A
Details
Process cooling, loop 3
N/A
N/A
A
Details
Process cooling, loop 4
N/A
N/A
A
Details
Process cooling, loop 5
N/A
N/A
A
Details
Process cooling, loop 6
N/A
N/A
A
Details
Process cooling water
N/A
N/A
A
Details
Chip scanner - Raith
Raith
Chip Scanner Two-HS
C
Details
EBL - JEOL JBX 9300FS
JEOL Ltd.
JBX9300FS
E
Details
EBL Sample pre-aligner
Chalmers MC2
PAMS 1101
A
Details
ALD - Oxford FlexAl
Oxford Instruments
FlexAl
C
Details
Dry etch ICP - Oxford PlasmaPro 100
Oxford Instruments
PlasmaPro 100 Cobra ICP 180
D
Details
Laser writer - DWL 2000
Heidelberg Instruments
DWL 2000
C
Details
Dry Etch ICP - Oxford - Deep Silicon etch
Oxford Instruments
Plasma Pro 100
D
Details
Sputter - HHV UHV
HHV
?
D
Details
Dry etch ICP - Oxford PlasmaPro 100 Cl2
Oxford
PlasmaPro 100
D
Details
Tripod
Samsung
S10
A
Details
Film stress measurement
KLA Tencor
FLX 2320
B
Details
CVD - MTI - 2D materials
MTI
-
B
Details
Furnace - Tempress #2-2 LPCVD - TEOS
Tempress
?
C
Details
Furnace - Tempress #2-3 LPCVD - SiN
Tempress
?
C
Details
Furnace - Tempress #2-1 LPCVD - Polysilicon
Tempress
?
C
Details
CVD - MTI - Graphene
MTI Corporation
OTF-1200X-4-II-C4OV-SL
A
Details
CVD - Aixtron - Graphene
Aixtron
BM HT Pro 2-inch
C
Details
Furnace - Graphene SiC
Graphensic
-
B
Details
Furnace - Lenton
Lenton
AWF 12/65
A
Details
CVD - Aixtron - CNT
Aixtron
Black Magic 2-inch
C
Details
Furnace - Centrotherm #3-2 Low temp anneal
Centrotherm
Au anneal
B
Details
Furnace - Centrotherm #3-3 High temp anneal
Centrotherm
Hi temp anneal
B
Details
Furnace - Centrotherm #1-1 Oxidation (restricted)
Centrotherm
Dry oxidation
B
Details
Furnace - Centrotherm #1-2 Wet & dry oxidation (public)
Centrotherm
Wet oxidation
B
Details
Furnace - Centrotherm #1-3 Wet & dry oxidation
Centrotherm
Wet oxidation
B
Details
Furnace - Centrotherm #4-2 LPCVD - TEOS
Centrotherm
LP-TEOS
C
Details
Furnace - Centrotherm #4-3 LPCVD - SiN
Centrotherm
LPCVD Furnace
C
Details
Furnace - Centrotherm #4-4 LPCVD - Polysilicon
Centrotherm
LP-Polysilicon
C
Details
Furnace - Thermolyne - Open Tube/1600°C
Barnstead/Thermolyne
Thermolyne- M. 59340
B
Details
SEM - Zeiss Gemini 560
Zeiss
Gemini 560
A
Details
SEM - Zeiss Sigma 360
Zeiss
Sigma 360
A
Details
Developer Spinner - Osiris UNIXX
Osiris
UNIXX D20
B
Details
Laser Writer - MLA 150
Heidelberg Instruments
MLA 150
D
Details
Dry Release Etch - Vapor HF Etcher - KLA
SPTS
uEtch
C
Details
Surface profiler - Sensofar neox - Optical
Sensofar
Neox 3D
C
Details
Microtransfer printer
XDisplay
MTP-1002
B
Details
Flip-Chip Bonder
FineTech
Fineplacer Femto 2
D
Details
Nanoimprint - CNI v2
NILT
CNI
B
Details
Wet Bench - Acid & Base - BOE bath
Stangl
Wet bench
A
Details
Electrochemical etching station
?
?
A
Details
Dry Release Etch - XeF2 - Memstar
Memstar
ORBIS ALPHA
C
Details
Mobile phone
Samsung
S10
A
Details
Wet Bench - Acid & Base
Stangl
Wet bench
A
Details
Wet Bench - Solvent
Stangl
Wet bench
A
Details
Spinner - Suss LabSpin6
Suss Microtech
-
A
Details
Parameter Analyzer - Keithley 4200SCS
Keithley
4200-SCS
B
Details
Wet Bench - Acid & Base - Developer Work
Stangl
Wet bench
A
Details
4-point probe - CMT SR2000N
AIT
CMT-SR2000N
B
Details
Vacuum oven - Hereaus
Hereaus
#500
A
Details
Wet Bench - Solvent - Ultrasonic bath
Stangl
Wet bench
A
Details
Wet Bench - Acid & Base - Electroplating
Stangl
Wet bench
B
Details
Wet Bench - Solvent - Ultrasonic bath
Stangl
Wet bench
A
Details
Wet Bench - Acid & Base
Stangl
Wet bench
A
Details
Wet Bench - Solvent - Liftoff Bath
Stangl
Wet bench
A
Details
Wet Bench - Solvent - Ultrasonic bath
Stangl
Wet bench
A
Details
Wet Bench - Solvent - Megasonic bath
Stangl
Wet bench
A
Details
Wet Bench - Solvent - Mask cleaning
Stangl
Wet bench
A
Details
Wet Bench - Acid & Base - Standard Clean baths (SC1/SC2)
Stangl
Wet bench
B
Details
Wet Bench - Acid & Base - Al-etch bath
Stangl
Wet bench
A
Details
Wet Bench - Acid & Base
Stangl
Wet bench
A
Details
Wet Bench - Acid & Base
Stangl
Wet bench
A
Details
Wet Bench - Solvent - Remover Bath
Stangl
Wet bench
A
Details
Fume Hood - Acid & Base - HF & BOE Work
Stangl
Fume Hood
A
Details
Fume Hood - Acid & Base - PLD target polishing
Stangl
Fume Hood
A
Details
Fume Hood - Acid & Base - Wash-up
Stangl
Fume Hood
A
Details
Vacuum sealer
AirZero
AZ-450
A
Details
CVD - Parylene
SCS
PDS 2010 Labcoter
A
Details
Raman microscope - Horiba
Horiba
XploRA
B
Details
Spinner - Polos & hotplates - Unconventional resists
Polos + BLE
Polos + Delta200_Hotplates
A
Details
Wet Bench - Solvent - Development work & Hot Plate
Stangl + BLE
Wet bench
A
Details
Spinner - Suss LabSpin6
Suss Microtech
-
A
Details
Wet Bench - Solvent - Developer Work
Stangl
Wet bench
A
Details
Fume Hood - Solvent
Stangle
Fume Hood
A
Details
Fume Hood - Acid & Base - Hot Acid Work
Stangl
Fume Hood
A
Details
Dry etch ICP - Oxford Plasmalab 100 - Two chambers
Oxford Plasma Technology
Plasmalab 100 ICP180
D
Details
Microscope - Olympus MX50 - Nano area
Olympus
MX50
A
Details
Microscope - Olympus MX50 - Nano area
Olympus
MX50
A
Details
Microscope - Olympus MX40 - III/V area
Olympus
MX40
A
Details
Microscope - Olympus MX40
Olympus
MX40
A
Details
Microscope stereo - Olympus SZX-12
Olympus
SZX-12
A
Details
Microscope - Olympus MX50 - III/V area
Olympus
MX50
A
Details
Microscope - Olympus MX40 - Silicon area
Olympus
MX40
A
Details
Microscope - Olympus MX50 - Metrology area
Olympus
MX50
A
Details
Microscope stereo - Olympus SZH-11
Olympus
SZH-10
A
Details
Microscope - Olympus BX52
Olympus
BX51
A
Details
Microscope stereo - Olympus SZX-9 - PL2
Olympus
SZX-9
A
Details
Process gases
N/A
N/A
A
Details
House vacuum system
N/A
N/A
A
Details
Compressed Dry Air
N/A
N/A
A
Details
Argon (Ar)
N/A
N/A
A
Details
Silane 5% (SiH4)
N/A
N/A
A
Details
Fluorine 5% (F)
N/A
N/A
A
Details
Solvent waste tank
N/A
N/A
A
Details
Diborane 5% (B2H6))
N/A
N/A
A
Details
Methane 5% (CH4)
N/A
N/A
A
Details
Acetylene (C2H2)
N/A
N/A
A
Details
Octafluorocyclobutane (C4F8)
N/A
N/A
A
Details
Tetrafluoromethane (CF4)
N/A
N/A
A
Details
Methane (CH4)
N/A
N/A
A
Details
Trifluoromethane (CHF3)
N/A
N/A
A
Details
Chlorine (CL2)
N/A
N/A
A
Details
Carbon dioxide (CO2)
N/A
N/A
A
Details
Hydrogen (H2)
N/A
N/A
A
Details
Hydrogen bromide (Hbr)
N/A
N/A
A
Details
Helium (He)
N/A
N/A
A
Details
Krypton (Kr)
N/A
N/A
A
Details
Nitrous oxide (N2O)
N/A
N/A
A
Details
Neon (Ne)
N/A
N/A
A
Details
Nitrogen trifluoride (NF3)
N/A
N/A
A
Details
Ammonia (NH3)
N/A
N/A
A
Details
Oxygen (O2)
N/A
N/A
A
Details
Sulfur hexafluoride (SF6)
N/A
N/A
A
Details
Silicon tetrachloride (SiCl4)
N/A
N/A
A
Details
Dichlorosilane (SiH2Cl2)
N/A
N/A
A
Details
Silane LPCVD (SiH4)
N/A
N/A
A
Details
Silane Oxford (SiH4)
N/A
N/A
A
Details
Process cooling, loop 7
N/A
N/A
A
Details
Hydrogen 5% in argon (H2/Ar)
N/A
N/A
A
Details
Boron trichloride (BCl3)
N/A
N/A
A
Details
Dry scrubbers
N/A
N/A
A
Details
Dry scrubber #7082, #7083, #7084
N/A
N/A
A
Details
Dry scrubber, #305
N/A
N/A
A
Details
Dry scrubber #445
N/A
N/A
A
Details
Dry scrubber #404, #412, #429
N/A
N/A
A
Details
Dry scrubber #1165
N/A
N/A
A
Details
Dry scrubber #314, #315
N/A
N/A
A
Details
Solvent exhaust FF01, floor 9
N/A
N/A
A
Details
Acid/base exhaust FF02, floor 9
N/A
N/A
A
Details
Poisonous exhaust FF03-04, floor 9
N/A
N/A
A
Details
Wet scrubber, poisonous
Colasit
N/A
A
Details
Vacuum oven - Polyimide
Yield Engineering Systems
YES-PB6
A
Details
Di water, loop 1
N/A
N/A
A
Details
Di water, loop 2
N/A
N/A
A
Details
Di water, loop 3
N/A
N/A
A
Details
Di water, loop 4
N/A
N/A
A
Details
Wet scrubber, acid/base
Colasit
N/A
A
Details
Neutralization waste tank
N/A
N/A
A
Details
Fan exhaust systems, floor 9
N/A
N/A
A
Details
Di water
N/A
N/A
A
Details
Wet scrubbers
N/A
N/A
A
Details
PECVD - Smoltek - Remote plasma
DCA
?
C
Details
TA07
N/A
N/A
A
Details
Air treatment
N/A
N/A
A
Details
TA01
N/A
N/A
A
Details
TA02
N/A
N/A
A
Details
TA03
N/A
N/A
A
Details
TA04
N/A
N/A
A
Details
TA05
N/A
N/A
A
Details
TA06
N/A
N/A
A
Details
CA01
N/A
N/A
A
Details
CA02
N/A
N/A
A
Details
CA03
N/A
N/A
A
Details
CA04
N/A
N/A
A
Details
CA05
N/A
N/A
A
Details
CA06
N/A
N/A
A
Details
CA07
N/A
N/A
A
Details
CA08
N/A
N/A
A
Details
CA09
N/A
N/A
A
Details
Circulating fans
N/A
N/A
A